researchXchange: Characterization of Thin Films 25. Oktober 2019

25.10.2019, 12:00-12:45 Uhr – Raum E 013, Pestalozzistrasse 20, Burgdorf

Optical characterization of thin films by spectroscopic ellipsometry

Presentation

As a fundamental step in many applications, thin film authorizes the deposition of materials with extremely varied properties, targeting wide areas of use.

Spectroscopic Ellipsometry is providing a precise, nondestructive, fast and useful optical characterization method, which is found in areas such as the native oxide etching, thin film growth, or solar cells coatings. 

Speaker

Léo obtained an universitary technical diploma in Physical Measurement at the Université Paul Sabatier in Toulouse, France, followed by a Bachelor’s Degree of Science in Engineering in the domain of Material and Energy at the Université de Perpignan Via Domitia.

He is currently studying for his Master’s degree of Science in Engineering while working as an assistant for the Plasma Surface Engineering group of the Institute for Applied Laser, Photonics and Surface Technologies ALPS at the Bern University of Applied Sciences.

Léo Lapeyre
Léo Lapeyre

Steckbrief

  • Startdatum 25.10.2019, 12:00-12:45 Uhr
  • Ort Raum E 013, Pestalozzistrasse 20, Burgdorf

Kontakt

Online-Anmeldung

Hinweis

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