Advanced pulsed plasma processing tools for hard coatings
The 'AP3 - Hard' project will develop novel power supplies for pulse enhanced dc magnetron sputtering, and coating systems that employ this technology in order to produce thin films that would otherwise not be possible or be more expensive.
- Département HESB | Technique et informatique
- Pôle de recherche Technique de production
- Champ de recherche Technologies appliquées laser, photonique et de surface
- Organisme de financement UE 6e programme-cadre
- Durée (prévue) 01.11.2015 - 31.08.2018
- Direction du projet Thomas Nelis
- Mots-clés Plasma, Hard coating, HiPIMS
The 'AP3 - Hard' project will develop novel power supplies for pulse enhanced dc magnetron sputtering, and coating systems that employ this technology in order to produce thin films that would otherwise not be possible or be more expensive. In particular, the power supplies and coating systems from the project will improve the economic and technical competitiveness of boride and nitride coatings from reactive sputtering.
Functional coatings such as optical coatings, hard protective coatings, decorative coatings, are commonly compound coatings. The deposition of these coatings by conventional PVD deposition methods is very challenging.
plasma surface engineering, plasma diagnosis, materials
The various external parameters in the advanced pulsed plasma deposition system can be set in many different ways, which creates a multi-dimensional parameter space, where the optimum set points are unknown and need to be found for each deposition process.Therefore, it is important to develop and employ a robust set of tests and monitoring equipment in order to find the optimal configuration of the system.
Industrial PVD process equipment is typically not configured to employ plasma diagnosis tools for process optimisation and this complicates the design of the tools- This project will therefor develop a set of tools for plasma diagnosis.