Hybrid vapour deposition methods for tailored film fabrication
Thin films allow improving and/ or modifying the surface properties of a plethora of materials
for a wide range of applications. With the trend leading towards component miniaturisation,
the requirements for thin films have become increasingly demanding. Consequently,
conventional techniques need to be revised and modified to allow for improved control over
the fabrication process to facilitate the production of high-quality thin films that reach the
demands of modern technologies.
With this in mind, this talk will focus on demonstrating the potential of combinatorial approaches for the deposition and tailoring of thin films for specific applications by using hybrid vapour deposition (HVD) techniques and plasma technologies, including high-power impulse
magnetron sputtering (HiPIMS) and solid-state microwave generators.
Caroline Hain is a materials scientist and doctoral student, currently working at Bern University of Applied Sciences (BFH), within the group for Plasma Surface Engineering.
Ms. Hain attended AGH University of Science and Technology (Kraków, Poland) at the Faculty of Metals Engineering and Industrial Computer Science, where she completed her Bachelor and Master studies in the field of Materials Science, and specialized in Surface Engineering.
During the course of her studies, she participated in internships at the Academic Centre for Materials and Nanotechnology (Krakow, Poland) and Empa Swiss Federal Laboratories for Materials Science and Technology (Dübendorf, Switzerland).
For her doctoral studies, Ms. Hain is enrolled at École polytechnique fédérale de Lausanne (EPFL), at the EDMX Materials Science and Engineering doctoral school.